Home ꄲ 42000 Series-Other Equipment ꄲ 42012A PVD-5080 High-Vacuum Single-Chamber Magnetron Sputtering Thin Film Deposition System

42012A PVD-5080 High-Vacuum Single-Chamber Magnetron Sputtering Thin Film Deposition System

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Tag No. : 42012A

Model: PVD-5080

Name: High-Vacuum Single-Chamber Magnetron Sputtering Thin Film Deposition System

1. The main components and technical indicators of the system

SN	Description
1.1	Ultimate vacuum degree of sputtering chamber: ≤6X10-5 Pa (after baking and degassing) within 12h;
1.2	Expose the system to the atmosphere for a short time and fill it with dry nitrogen to start pumping: the sputtering chamber can reach 6.6X10^-4 Pa in 45 minutes;
1.3	Vacuum degree after 12 hours of shutting down the pump in the sputtering chamber: ≤10Pa;
1.4	The system is mainly composed of sputtering vacuum chamber, magnetron sputtering target, new substrate stage, working gas circuit, exhaust system, installation machine, vacuum measurement and electric control system, etc.;

For more details, please feel free to contact us by email sales@wintekgroup.com

Key Words: High-Vacuum Single-Chamber Magnetron Sputtering Thin Film Deposition System, Thin Film Deposition System, Magnetron Sputtering Equipment

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