42009A FJL560 High Vacuum Ion Beam Sputtering System
Tag No. : 42009A
Model: FJL560
Name: High Vacuum Ion Beam Sputtering System
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Description |
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Actual picture |
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1.1 |
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Application |
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2.1 |
For preparation: Au, Ag, Pt, W, Mo, Ta, Ti, Al, Si, Cu, Fe, Ni, alumina, titania, zirconia, ITO, AZO, tantalum nitride, titanium nitride Wait.
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The multi-target oblique co-sputtering method can deposit mixture/compound films.
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Oxygen, nitrogen or other reactive gases are added during the sputtering process to deposit a compound film of target material and gas molecules.
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The equipment is simple and easy to control, the coating area is large, and the film adhesion is strong, especially suitable for materials with high melting point and low vapor pressure.
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Ion beam sputtering technology is one of the main technologies of industrial coating, which is easy to transform scientific research results, and is one of the most economical and effective methods for promoting new technologies to the industrial field.
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For more details, please feel free to contact us by email sales@wintekgroup.com
Key Words: High Vacuum Ion Beam Sputtering System, Multifunctional Ion Beam Combined Sputtering System, Vacuum Magnetron Sputtering Coating System
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